Title:
MANUFACTURE OF DEVICE
Document Type and Number:
Japanese Patent JP2824350
Kind Code:
B2
Abstract:
PURPOSE: To perform the line width control of a resist in a lithograph processing process.
CONSTITUTION: It has been discovered that the loss of line width controllability of resist such as a chemical amplifier resist is caused by surface reaction due to basic materials such as amines which are present in a working environment under lithographic processing. This loss of line width controllability is generated by disabling the occurrence of chemical reaction required to occur originally, because of the reaction of acid generated by exposure radiations with amine. Such a problem is solved by using an acid-containing barrier layer on a resist layer. The basic material in the environment reacts preferentially with an acid in the barrier layer, and does not react with acid in the resist layer, so that the chemical reaction required to occur originally can be normally generated, and line width controllability can be maintained.
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Inventors:
Edwin Arthur Chandross
Omkaram Naramus
Elsa Raikhanis
Gary Newton Taylor
Larry Flack Thompson
Omkaram Naramus
Elsa Raikhanis
Gary Newton Taylor
Larry Flack Thompson
Application Number:
JP23376491A
Publication Date:
November 11, 1998
Filing Date:
August 22, 1991
Export Citation:
Assignee:
AT&T CORP.
International Classes:
C08L33/00; C08L33/04; G03F7/004; G03F7/027; G03F7/039; G03F7/09; H01L21/027; H01L21/30; H01L21/302; H01L21/3065; (IPC1-7): H01L21/027; C08L33/00; G03F7/027; H01L21/3065
Domestic Patent References:
| JP63287950A | ||||
| JP50152803A | ||||
| JP62223747A | ||||
| JP6279441A |
Attorney, Agent or Firm:
Hirofumi Mimata
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