To provide a method for manufacturing a exposure lens capable of effectively remove wax on a lens face and manufacturing a light exposure lens having a high-precision lens face.

In this method, a exposure lens is fixed to a die by a fixer and molded in a specified shape (drilling process S1), a light exposure lens molded by this drilling process S1 is polished (polishing process 82), the exposure lens after the drilling process S1 and the polishing process S2 is rinsed (rinsing process S3), and this rinsing process is a process for performing ultrasonic rinsing with a water solution of a releasing agent that is a main component of an anion-based critical surface activator as a rinsing liquid.