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Patent Searching and Data


Title:
MANUFACTURE OF TRANSISTOR
Document Type and Number:
Japanese Patent JPH01202861
Kind Code:
A
Abstract:

PURPOSE: To manufacture a mechanically firm transistor having excellent high- frequency characteristics easily by forming a first electrode connected from a first conductive layer to a first semiconductor region and extended onto first and second inclined inner side faces.

CONSTITUTION: Even when a semiconductor region 4. is shaped so that length in the direction that semiconductor regions 5, 6 are tied is shortened sufficiently, an electrode 7 on the semiconductor region 4 is also extended onto inclined inner side faces 11b, 12b on insulating layers 11', 12'. Consequently, a transistor can be given large volume easily and can be formed mechanically firmly. Since electrodes 8, 9 are shaped in a self-alignment manner, distances among each of the electrodes 8, 9 and the electrode 7 are shortened, and the electrodes 8, 9 can be formed easily. Accordingly, the mechanically strong transistor having excellent high-frequency characteristics can be manufactured readily.


Inventors:
YAMAHATA SHIYOUJI
ADACHI SADAO
Application Number:
JP2687788A
Publication Date:
August 15, 1989
Filing Date:
February 08, 1988
Export Citation:
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Assignee:
NIPPON TELEGRAPH & TELEPHONE
International Classes:
H01L29/417; H01L21/331; H01L21/337; H01L21/338; H01L29/72; H01L29/73; H01L29/80; H01L29/808; H01L29/812; (IPC1-7): H01L29/50; H01L29/72; H01L29/80
Attorney, Agent or Firm:
Shoji Tanaka