To provide low specific resistance even in a low temperature base board over a wide oxygen partial pressure range by using a specific magnetron cathode, and setting the ratio of an integral value of a magnetic flux from a magnetic pole of the cathode central part to an integral value of a magnetic flux from a magnetic pole of the cathode outer peripheral part not less than a specific value.
The unbalanced magnetic field distribution is formed by changing magnetic field intensity of an electromagnet by using a cathode by arranging a magnetic field intensity variable electromagnet in the cathode outer peripheral part of a magnetron cathode enclosing a permanent magnet (made of ferrite). In this case, a film is formed by setting the ratio of an integral value of a magnetic flux from a magnetic pole of the cathode central part to an integral value of a magnetic flux from a magnetic pole of the cathode outer peripheral part not less than 1.2. That is, a method is taken to expand plasma to the vicinity of a base board by throwing off a balance of magnetic field intensity. Therefore, since electric potential of a target does not particularly largely changes, the restraint of film inside damage by irradiation of a high energy particle is compatible with the promotion of heating by high temperature electron gas on the base board surface.
NAKAI JUNICHI
AKARI KOUICHIROU
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