To provide a manufacturing method of a color filter substrate, with which an adequate cell gap is obtained, deterioration of display quality is scarce, and further which is excellent in productivity, when the color filter substrate is used for a liquid crystal display device.
The manufacturing method of the color filter substrate is characterized by having: a photosensitive resin layer forming step to form the photosensitive resin layer 5 composed of a photosensitive resin on a substrate 10 for a color filter, having a transparent base material 1, light shielding sections 2 formed on the transparent base material 1, coloring layers 3 of three or more colors formed on openings of the light shielding sections 2, and layered columns 4 formed on areas of the light shielding sections 2 except for the openings and composed of at least one or more coloring layers 3; and a spacer overcoat layer forming step to simultaneously form spacers 9 having the layered columns 4 and layered column vertex portions 7 formed on the layered columns 4 and composed of the photosensitive resin, and the overcoat layer 6 composed of the photosensitive resin by exposing the photosensitive resin layer 5 using a multi-gradation mask 20 and developing it.
HINO KAZUYUKI
TAWARAYA SEIJI
KITAGUCHI TAKASHI
| JP2000089026A | 2000-03-31 | |||
| JP2001100652A | 2001-04-13 | |||
| JP2002277899A | 2002-09-25 |
Kishimoto Tatsuto
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