To manufacture easily an electron source substrate having an electron emitting element which is superior in electron emission quantity and hardly brings about the increase of element current with time by using a compound substrate 1 having an activation promoting layer 1b, in the manufacturing method of the electron source substrate in which, after forming a plurality of pairs of element electrodes 2, 3 on a substrate using a dry etching process, a conductive film 4 crossing over each pair of element electrodes 2, 3 is formed, and by applying electric flow process on this conductive film 4, an electron emitting part 5 is formed, and further an activation process of impressing a voltage to each pair of element electrodes 2, 3 under the existence of an organic substance gas is applied.
Before forming a conductive film after forming element electrodes 2, 3, a surface renewal process for renewing the activation promoting layer 4 is applied.
YAMADA NOBUTSUGU
ENOMOTO TAKASHI
Yoshihiro Yamaguchi