Title:
MANUFACTURING METHOD OF GAS BARRIER FILM
Document Type and Number:
Japanese Patent JP2017154124
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a means capable of suppressing deformation of a film and improving gas barrier property while suppressing decrease of productivity to the minimum in a manufacturing method of a gas barrier film.SOLUTION: A manufacturing method of a gas barrier film includes: a process of preparing a first lamination body by applying coating liquid containing a silicon-containing compound onto stretching base material which is unstretched or uniaxially stretched to form a coated film on the base material; and a process of preparing a second laminate body by stretching the first laminate body and, thereafter, reforming the silicon-containing compound by heating to form a reformed coated film.SELECTED DRAWING: None
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Inventors:
YASUI CHIKARA
Application Number:
JP2016042712A
Publication Date:
September 07, 2017
Filing Date:
March 04, 2016
Export Citation:
Assignee:
KONICA MINOLTA INC
International Classes:
B05D5/00; B05D3/02; B05D3/12; B05D7/04; B05D7/24; B32B9/00; B32B38/18
Attorney, Agent or Firm:
Hatta International Patent Corporation