To surely suppress peeling of a treatment film used for patterning and generation of residue (patterning defect) on a glass substrate when applying a patterning treatment film on the glass substrate.

When a glass substrate is manufactured, a protection film is pasted on the manufactured glass substrate, and the glass substrate with the protection film pasted thereon is stored in a container. A treatment to prevent the generation of dew condensation of water vapor between the protection film and the glass substrate is performed in at least either when the protection film is pasted or during the storage in the container.