Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
MANUFACTURING METHOD OF HIGH PURITY METHACRYLIC ACID
Document Type and Number:
Japanese Patent JP2005023060
Kind Code:
A
Abstract:

To provide a manufacturing method of substantially pure methacrylic acid containing at least 99 wt% of methacrylic acid, at most 0.05 wt% of water and other impurities in a constant and reduced amount compared with methacrylic acid of other grades.

A process for manufacturing in a high yield high purity methacrylic acid (HPMAA) which is substantially pure, particularly that which has a purity of at least 99% and a water content of at most 0.05% and contains a minor amount of other impurities including HIBA (2-hydroxyisobutyric acid), acrylic acid, MOMPA (3-methacryloyloxy-2-methylpropionic acid), methacrolein and the like is provided. The improved process comprises feeding a crude methacrylic acid stream and purifying the crude MAA stream in a series of successive distillation steps including two distillation columns. The process permits the manufacture of a high purity methacrylic acid product particularly suitable for the manufacture of a specialty MAA polymer.


Inventors:
DECOURCY MICHEL STANLEY
ELDER JAMES EDWARD
JOHN JULIETTE JAMIE JERRICK
Application Number:
JP2004055722A
Publication Date:
January 27, 2005
Filing Date:
March 01, 2004
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ROHM & HAAS
International Classes:
C07C51/42; C07C51/44; C07C51/487; B01D3/14; C07C51/50; C07C57/04; C07C67/54; C07C69/54; (IPC1-7): C07C51/44; B01D3/14; C07C57/04
Attorney, Agent or Firm:
Minoru Senda
Hisashi Tsuji
Koji Hashimoto