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Title:
正孔輸送材料の製造方法
Document Type and Number:
Japanese Patent JP3608014
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve mechanical and thermal durability of polysilane, by forming Si-Si, Ge-Ge, or Si-Ge bond as a skeleton, and having a branch structure in the skeleton. SOLUTION: In polysilane, Si-Si, Ge-Ge, or Si-Ge bond shown by formula 1 (R is hydrogen atom, alkyl aryl, alkoxy, amino, silyl group of 1 to 14 carbon number, n is 2, m is 1 or more integer, A is Si or Ge) is formed as a skeleton, one kind of triholosilane, trihalogermane shown by formula 2 (X is halogen atom) is previously presented to electrode reaction using a specific metal in an anode, and a network polymer having halogen in the end is formed. Successively, one kind of dihalosilane, dihalogermane shown by formula 3 is added to this polymer, and with the Si-Si, Ge-Ge, or Si-Ge bound as the skeleton, a high polymer positive hole transport material with the skeleton having a branch structure is manufactured. In this way, mechanical and thermal durability of the polysilane can be improved, a good positive hole transport function having a visible emission function is obtained.

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Inventors:
Ryoichi Nishida
Shinichi Kawasaki
Hiroaki Murase
Tsuyoshi Fujiki
Application Number:
JP7226896A
Publication Date:
January 05, 2005
Filing Date:
March 27, 1996
Export Citation:
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Assignee:
OSAKA GAS CO.,LTD.
International Classes:
H01L51/50; C08G77/48; C08G77/60; C08G79/00; C09K11/06; H01B1/18; H05B33/14; (IPC1-7): H01B1/18; C08G77/60; C08G79/00; C09K11/06; H05B33/14
Domestic Patent References:
JP7316303A
JP7316304A
Attorney, Agent or Firm:
Eiji Saegusa
Kakehi Yuro
Takeshi Ohara
Hiroji Nakagawa
Yasumitsu Tate