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Title:
光電変換装置の製造方法および光電変換装置
Document Type and Number:
Japanese Patent JP5180781
Kind Code:
B2
Abstract:
Provided is a method for fabricating a photoelectric conversion device in which current is prevented as much as possible from leaking via an intermediate contact layer separating groove. The method includes: a process of forming a top layer (91) mainly containing amorphous silicon; a process of forming on the top layer (91) an intermediate contact layer (93) electrically and optically connected to the top layer (91); a process of removing the intermediate contact layer (93) through irradiation with a pulsed laser and forming an intermediate contact layer separating groove (14) that reaches the top layer (91) to separate the intermediate contact layer (93); and a process of forming, on the intermediate contact layer (93) and in the intermediate contact layer separating groove (14), a bottom layer (92) that mainly contains microcrystalline silicon and that is electrically and optically connected to the intermediate contact layer (93). The intermediate contact layer separating groove (14) is terminated in an i-layer of the top layer (91).

Inventors:
Kazutaka Uda
Tomoyoshi Baba
Takashi Ishide
Kohei Kawazoe
Nishinomiya Ritsuyoshi
Application Number:
JP2008284209A
Publication Date:
April 10, 2013
Filing Date:
November 05, 2008
Export Citation:
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Assignee:
MITSUBISHI HEAVY INDUSTRIES,LTD.
International Classes:
H01L31/04; H01L31/0463; H01L31/0465; H01L31/06; H01L31/076
Domestic Patent References:
JP2006313872A
JP2001274447A
JP2003273383A
JP2003298089A
JP2005038907A
JP5082816A
JP8330617A
Attorney, Agent or Firm:
Noriharu Fujita
Kunio Ueda