Title:
マーク位置検出装置、描画装置およびマーク位置検出方法
Document Type and Number:
Japanese Patent JP7084227
Kind Code:
B2
Abstract:
A writing apparatus includes a function as a mark position detecting apparatus detecting a position of a mark on a substrate held on a stage. The writing apparatus obtains a first image (83a) showing a first region on the substrate, the region including a position of a mark in design, and obtains a second image (83b) showing a second region a part of which overlaps on the first region while moving the stage. Further, the writing apparatus composes the first image (83a) and the second image (83b) to produce a composed image (85). The writing apparatus obtains a position of the mark on the basis of the composed image (85). This makes it possible to easily enlarge the field of vision without lowering resolution of the image capturing device, and to thereby reduce error of detecting a position of the mark on the substrate.
Inventors:
Naotake Tanaka
Application Number:
JP2018118988A
Publication Date:
June 14, 2022
Filing Date:
June 22, 2018
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
G01B11/00; G03F9/00
Domestic Patent References:
| JP2013120108A | ||||
| JP2015064461A | ||||
| JP3241896A |
Foreign References:
| US6661931 |
Attorney, Agent or Firm:
Masahiro Matsuzaka
Tsutomu Tanaka
Yamamura Issei
Tsutomu Tanaka
Yamamura Issei
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