Title:
MASK AND METHOD FOR INSPECTING ALIGNER, AND ALIGNER
Document Type and Number:
Japanese Patent JP3718511
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To simply inspect the polarization state of illumination light of an aligner in an inspection method of the aligner for exposing an object to be exposed such as a wafer or the like by a mask pattern, in a mask for inspecting an aligner and in the aligner.
SOLUTION: The mask 50 for inspection is placed on a photomask stage 34 of the aligner 30. The mask 50 for inspection has a light shielding pattern 53 formed on the side of the rear surface of a transparent substrate 51, and the image 41' of a secondary light source 41 is formed on the side of the front surface of the transparent substrate 51 through a pin hole 55 formed in the light shielding pattern 50. A light flux that forms the image 41' passes through polarizer patterns 56 to 59 and is projected on a resist applied on the wafer 35. The degree of the removal of the resist is changed depending on directions of polarization axes of the polarizer patterns 56 to 59, on the basis of which it is determined whether or not the direction of the polarization of the secondary light source 41 lies in a desired direction.
Inventors:
Kazuya Fukuhara
Application Number:
JP2003348132A
Publication Date:
November 24, 2005
Filing Date:
October 07, 2003
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
C01B33/18; C01F7/02; C08K7/18; C08L101/00; C09K5/08; G03B27/42; G03F1/00; G03F1/68; G03F7/20; G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G03F1/08; G03F7/20
Domestic Patent References:
| JP10335207A | ||||
| JP2003194529A | ||||
| JP2000114157A | ||||
| JP8008177A | ||||
| JP8236439A | ||||
| JP2002329653A | ||||
| JP5088356A | ||||
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Attorney, Agent or Firm:
Masaru Itami