Title:
MASK FOR X-RAY EXPOSURE AND EXPOSURE PROCESS USING THE SAME
Document Type and Number:
Japanese Patent JPH01155623
Kind Code:
A
Abstract:
PURPOSE:To restrain a mask from making the local temperature difference without shifting mask patterns thereby transferring the exposure with high precision by a method wherein a conductive heating body is provided on the scribe line positions etc., excluding the transfer patterns of a mask to be supplied with power corresponding to exposure. CONSTITUTION:The images of mask patterns 3 are transferred onto a substrate by scanning the images with X-rays (SOR beams) 8 picked up as slit beams to project the mask pattern 3 on a resist on the substrate. At this time, non- exposed regions (not being exposed) are heated or previously held in the specific high temperature state by supplying a conductive heat generating body 5 with power through the intermediary of electrodes 6, 6'. In other words, the non- exposed regions are exposed while restraining the mask patterns from making local temperature difference due to the beam irradiation. At this time, the scanning speeds of X-rays are differentiated by the sensitivity of the resist.
Inventors:
KATO HIDEO
CHIBA KEIKO
SHIBATA HIROFUMI
CHIBA KEIKO
SHIBATA HIROFUMI
Application Number:
JP31427287A
Publication Date:
June 19, 1989
Filing Date:
December 14, 1987
Export Citation:
Assignee:
CANON KK
International Classes:
G03F1/00; G03F7/20; H01L21/027; (IPC1-7): G03F1/00; H01L21/30
Attorney, Agent or Firm:
Tetsuya Ito (1 outside)
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