To accurately transfer a pattern without transfer defects even when a mask having a large-size circuit pattern for exposure is used.

Plural numbers of pellicle frames 13-16 adhered with pellicles 17-20 are arranged on a mask 10 having a circuit pattern so that the pattern is divided by the frames 13-16 based on the pattern arrangement. Thus, even when the mask 10 is made large in size, the frames 13-16 and the pellicles 17-20 can be made small in size according to the arrangement of the circuit pattern. Thus, deformation of the pellicle frames 13-16 and pellicles 17-20 can be prevented and the pattern can be accurately transferred without producing transfer defects.