Title:
MEASURING METHOD AND MEASURING APPARATUS OF CONCENTRATION OF METAL ION IN LIQUID AND CLEANING SYSTEM OF ELECTRONIC DEVICE
Document Type and Number:
Japanese Patent JP2016162963
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a measuring method and a measuring apparatus of the concentration of metal ions in a liquid, such as a sulphuric acid-based chemical, used for cleaning an electronic device capable of measuring the concentration in a process in real time, and to provide a cleaning method and a cleaning system of an electronic device using the same.SOLUTION: In a method of measuring the concentration of metal ions in a sample liquid, containing one kind or more of ions of metal elements in the third through sixth periods of a periodic table and having an electric conductivity exceeding 0.33 S/cm, by plasma emission spectrometry, preprocessing for preparing an adjustment liquid, where the electric conductivity of the sample liquid has been adjusted to 0.33 S/cm or less, is performed before the concentration of metal ions in the liquid is measured for the adjustment liquid. A cleaning method of an electronic device for measuring the concentration of metal ions in the cleaning liquid for cleaning the electronic device is also provided.SELECTED DRAWING: Figure 1
Inventors:
YAMAKAWA HARUYOSHI
Application Number:
JP2015042521A
Publication Date:
September 05, 2016
Filing Date:
March 04, 2015
Export Citation:
Assignee:
KURITA WATER IND LTD
International Classes:
H01L21/304; G01N21/66
Attorney, Agent or Firm:
Tsuyoshi Shigeno
Takayuki Shigeno
Takayuki Shigeno