Title:
メガ帯域システム
Document Type and Number:
Japanese Patent JP2004535662
Kind Code:
A
Abstract:
A process tank for stripping photoresist from semiconductor wafers. In one aspect the invention is a process tank having a process chamber, means to support at least one wafer in the processing chamber, means for supplying a process liquid to the chamber, a lid adapted to close the chamber, a liquid level sensor adapted to stop the supply of process liquid to the chamber when the process liquid fills the chamber to a predetermined level below a wafer supported in the processing chamber, an acoustical energy source adapted to supply acoustical energy to process liquid located in the chamber so as to create a mist of the process liquid in the processing chamber, and means to supply a process gas to the chamber, the process gas supply means being located above the predetermined level and adapted to supply process gas to the chamber under pressure during mist creation.
Inventors:
Kashkou, Ismail
Novak, Richard
Nemes, Dennis
Chen, Jim
Novak, Richard
Nemes, Dennis
Chen, Jim
Application Number:
JP2002579135A
Publication Date:
November 25, 2004
Filing Date:
April 08, 2002
Export Citation:
Assignee:
Aklion El Lsee
International Classes:
H01L21/027; B08B3/02; B08B7/00; H01L21/00; H01L21/304; (IPC1-7): H01L21/304; H01L21/027
Attorney, Agent or Firm:
Kazuo Shamoto
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita