Title:
METHOD AND APPARATUS FOR COATING SUBSTRATE, METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY AND METHOD FOR MANUFACTURING FLAT LIGHTING SYSTEM
Document Type and Number:
Japanese Patent JP3711456
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method and apparatus for obtaining a high quality coating film on a substrate.
SOLUTION: A thin film material solution 3 for a liquid crystal display set in the body 2 of an atomizing unit is atomized by vibration of an ultrasonic vibrator 1 to generate mist 5. This mist 5 is conveyed along the tube inside of a mist guide nozzle 6 by gas blown from a blast nozzle 7. A static electricity generating nozzle 20 has been set near the tip of the nozzle 6 and the mist 5 of the thin film material solution 3 for a liquid crystal display is charged with static electricity generated there. The mist 5 flies toward a substrate 12 for a liquid crystal display and coats the top face of the substrate 12. A formed film is heated with a heater 15 during coating.
Inventors:
Gyoda Kozo
Hirofumi Kasuga
Hirofumi Kasuga
Application Number:
JP2003157090A
Publication Date:
November 02, 2005
Filing Date:
June 02, 2003
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
G02F1/13; B05B5/025; B05B5/08; B05D1/04; B05D1/32; G02F1/1333; (IPC1-7): B05B5/025; B05B5/08; B05D1/04; B05D1/32; G02F1/13; G02F1/1333
Domestic Patent References:
| JP61234966A | ||||
| JP3500777B2 |
Attorney, Agent or Firm:
Kazuya Nishi
Masatake Shiga
Masakazu Aoyama
Masahiko Ueyanagi
Fujitsuna Hideyoshi
Osamu Suzawa
Masatake Shiga
Masakazu Aoyama
Masahiko Ueyanagi
Fujitsuna Hideyoshi
Osamu Suzawa