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Patent Searching and Data


Title:
METHOD AND APPARATUS FOR DETECTING ABNORMALITY IN WAFER LOADED IN ADAPTOR FOR HOLDING OF SEMICONDUCTOR WAFER
Document Type and Number:
Japanese Patent JP2000323555
Kind Code:
A
Abstract:

To realize a wafer abnormality detection method which can detect an abnormality in a semiconductor wafer, such as wafer loaded in an adaptor being tilted.

A distance measuring device 21 for measuring a distance thereof from the outer peripheral part of a semiconductor wafer 2 loaded in an adaptor 1 is previously located at a constant position above the adaptor, the distance measuring device 21 measures the distance from the outer peripheral part of the semiconductor wafer, while the adaptor 1 is rotated. When the measured distance becomes a preset deciding value of smaller, it is decided that a tilt of the wafer exceeded its allowable range.


Inventors:
NAKAZAWA MAKOTO
Application Number:
JP12920199A
Publication Date:
November 24, 2000
Filing Date:
May 10, 1999
Export Citation:
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Assignee:
NISSIN HIGH VOLTAGE CO LTD
International Classes:
H01L21/683; H01L21/68; (IPC1-7): H01L21/68
Attorney, Agent or Firm:
Hidetoshi Matsumoto