To draw a fine pattern such a hard disk pattern on an entire substrate surface with high accuracy in a short time by simple control.

In drawing an electron beam EB by drawing-on/off control depending on the rotation of a substrate while rotating a resist-coated substrate 10 in one direction, the electron beam is deflected in the substrate rotation direction and the radial direction to be moved to the drawing start position of a second section, after drawing on a first section of an element divided into n parts in the radial direction. The drawing operation is performed on the element m times (m≥2) per rotation, and the subsequent elements are sequentially drawn thereafter.