Title:
METHOD AND APPARATUS FOR FORMING MASK PATTERN UTILIZING SPATIAL FREQUENCY DOUBLING TECHNIQUE
Document Type and Number:
Japanese Patent JP3913191
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for substantially automating designing of a mask by using chromless phase lithographic techniques in order to lower the threshold dimensions of a mask pattern used for a lithographic projection apparatus as this designing is a difficult work of a long time requiring a high technical level.
SOLUTION: The method includes the steps of determining the target pattern representing a circuit design to be printed on a substrate 14; generating a first pattern by scaling the target pattern by a factor of 0.5; and generating a second pattern by performing a Boolean operation which combines the target pattern and the first pattern. The mask 12 having the second pattern is then utilized to print the target pattern on the substrate 14. According to this method, the time and effort required for the mask design can be reduced and even a designer of a low level is able to create the good-quality mask 12.
Inventors:
Douglas Van Den Broke
Jean fan chen
Jean fan chen
Application Number:
JP2003124534A
Publication Date:
May 09, 2007
Filing Date:
March 25, 2003
Export Citation:
Assignee:
AS M Mask Tools B.V.
International Classes:
G03F1/00; G03F7/20; G06F17/50; H01L21/027; (IPC1-7): G03F1/00; G03F7/20; H01L21/027
Domestic Patent References:
| JP11338122A | ||||
| JP8286358A | ||||
| JP2000112113A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Hideto Asamura
Hajime Asamura
Takakazu Yamamoto
Yukio Iwamoto
Shinji Oga
Toshifumi Onuki
Hideto Asamura
Hajime Asamura
Takakazu Yamamoto
Yukio Iwamoto