Title:
METHOD AND APPARATUS FOR INSPECTING FOREIGN MATTER OF RESIST COATING FILM
Document Type and Number:
Japanese Patent JP3166320
Kind Code:
B2
Abstract:
PURPOSE: To provide a method for detecting presence of a fine foreign matter mixed with a photosensitive resist film of a dry plate to be used to manufacture a reticle mask, etc., over an entire thickness of a coating film.
CONSTITUTION: An optically permeable board 1 is irradiated with an inspection light 6 from one side of an element 4 to be inspected and coated with a resist film 2. Scattered light from the element 4 to be irradiated to the other side is focused on a light receiving surface of a photoreceiver 8. The image is divided into meshes, individual light reception signals corresponding to mesh regions are binarized, and information of a distributed state of foreign matter in the resist film of a region to be irradiated is obtained from a distribution pattern 11 of a binary signal group.
Inventors:
Yuichi Yamamoto
Eiichi Hoshino
Eiichi Hoshino
Application Number:
JP17356992A
Publication Date:
May 14, 2001
Filing Date:
July 01, 1992
Export Citation:
Assignee:
富士通株式会社
International Classes:
G01N21/88; G01N21/94; G01N21/956; G03F1/84; H01L21/027; H01L21/30; (IPC1-7): G03F1/08; G01N21/88
Domestic Patent References:
| JP63103949A | ||||
| JP63268245A | ||||
| JP61122648A |
Attorney, Agent or Firm:
Junichi Yokoyama
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