Title:
METHOD AND APPARATUS FOR MEASURING INTERFERENCE, PROJECTION OPTICAL SYSTEM, METHOD FOR MANUFACTURING THE SAME AND PROJECTION EXPOSURE UNIT
Document Type and Number:
Japanese Patent JP2003214814
Kind Code:
A
Abstract:
To raise a measuring accuracy of an interference measurement using a diffraction optical element.
The method for measuring the interference using a null element having the diffraction optical element comprises the steps of detecting interference fringes, in both a state in which a luminous flux passing through a partial region of the diffraction optical element of the measured luminous flux is limited and in a state in which the luminous flux is not limited, and acquiring characteristic data in which an error is avoided, based on the detected interference fringes.
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Inventors:
TAKIGAWA YUICHI
KOMATSUDA HIDEKI
KOMATSUDA HIDEKI
Application Number:
JP2002017251A
Publication Date:
July 30, 2003
Filing Date:
January 25, 2002
Export Citation:
Assignee:
NIKON CORP
International Classes:
G01B9/02; G01B11/27; G02B5/18; H01L21/027; (IPC1-7): G01B9/02; G02B5/18; H01L21/027
Attorney, Agent or Firm:
Furuya