METHOD AND APPARATUS FOR RADIATION GRAFT POLYMERIZATION ON LONG MACROMOLECULAR SUBSTRATE

Title:

METHOD AND APPARATUS FOR RADIATION GRAFT POLYMERIZATION ON LONG MACROMOLECULAR SUBSTRATE

Document Type and Number:

Japanese Patent JP3955996

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a method and apparatus for uniformly and efficiently carrying out radiation graft polymerization with a little monomer amount on a long organic macromolecular substrate such as the one having a shape of a film, a net or the like.
SOLUTION: The method for carrying out the radiation graft polymerization on the long organic macromolecular substrate comprises a step for sending out the long organic macromolecular substrate successively, and irradiating the substrate with radioactive rays, a step for carrying out the graft polymerization while spraying a monomer liquid on the radiated substrate. The obtained grafted material can usefully be used for a gas-removing filter, a heavy metal-removing filter, an ion-exchange material, an ion-removing filter for a liquid or the like.

Inventors:

Kunio Fujiwara
Kawazu Hideo
Junichi Sugano
Takanobu Sugo

Application Number:

JP2002303989A

Publication Date:

August 08, 2007

Filing Date:

October 18, 2002

Export Citation:

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Assignee:

Japan Atomic Energy Agency
Ebara Corporation

International Classes:

C08F291/00; (IPC1-7): C08F291/00

Domestic Patent References:

JP60147447A
JP4132713A
JP8188663A
JP57073027A
JP62022811A

Attorney, Agent or Firm:

Kazuo Shamoto
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Shurin Sakurai
Fujihiro Kanda
Hideo Tanaka
Shinya Hosokawa
Norihiro Fukasawa
Koji Hirayama
Tadahiko Kurita
Shurin Sakurai
Kiyoshi Murakami
Shinya Hosokawa
Takako Koiso

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