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Title:
METHOD AND DEVICE FOR FLUID TREATMENT IN SUBSTRATE
Document Type and Number:
Japanese Patent JP3732159
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a method and device for moving fluid by which a trace amount of fluid can be moved by an accurate amount.
SOLUTION: By using a substrate constituted by bonding a substrate to one surface of an elastic substrate on the other surface of which a fine channel is formed, the position to which a pressure is applied is moved in the longitudinal direction of the fine channel by applying a mechanical pressure to the substrate from the outside or in a state where the mechanical pressure is applied to the substrate. A concrete structure is provided with a substrate fixing base 40 used for fixing the substrate having the fine channel inside, a solid structure S constituted as a pressurizing means which applies the pressure to the surface of the substrate from the outside, and a linear moving device 34 connected to the structure S or base 40 and constituted as a moving means which moves the structure S or base 40 in the longitudinal direction of the fine channel.


Inventors:
Han, John Hoon
Lynn, Gwangsoup
Na, Kihoun
Kim, Suyeon
Park, Je Kyun
Application Number:
JP2002212150A
Publication Date:
January 05, 2006
Filing Date:
July 22, 2002
Export Citation:
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Assignee:
LG Electronics Co., Ltd.
Pohang University of Technology
International Classes:
G01N1/00; G01N31/20; B01L3/00; F04B43/04; F04B43/12; G01N1/14; G01N30/32; G01N30/60; G01N35/10; G01N37/00; (IPC1-7): G01N1/00; F04B43/12; G01N1/14; G01N30/32; G01N30/60; G01N31/20; G01N35/10; G01N37/00
Domestic Patent References:
JP60104260A
JP7012777A
JP2000246805A
JP9255098A
JP2594604Y2
JP8177744A
Attorney, Agent or Firm:
Masaki Yamakawa