To realize highly accurate superposition by performing desired correction of magnification differently in the direction of X axis and in the direction of Y axis.
A force is applied to a mask structure comprising a mask substrate on which a mask pattern is formed and a ring-like supporting frame 1 having a square window 2 with four points on the outer circumference of the supporting frame substantially located on the extension of both diagonals of the square window 2 as pressure applying points 4-7. The force is applied while adjusting the angle of a vector of force with respect to the center of each pressure applying point 4-7. A part of the pressure applying points is divided to apply a force in two orthogonal directions and a part of the vector of force is divided in the direction of X axis and Y axis parallel with the sides of the square window 2 so that the force can be applied to the supporting frame 1.
MIYAJI GOJI
HARA SHINICHI
TOKITA TOSHINOBU
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