METHOD AND DEVICE FOR PERFORMING STABILIZED DEPOSITION SPEED CONTROL IN LOW TEMPERATURE ALD SYSTEM BY ACTIVE HEATING OF SHOWER HEAD AND/OR COOLING OF PEDESTAL

Japanese Patent JP2016046524

A

PROBLEM TO BE SOLVED: To provide improved method and device for enhancing the consistency of processing conditions, the controllability, and/or the reproducibility of ALD(atomic layer deposition) cycle.SOLUTION: A thin film precursor is fed into a processing chamber via a shower head maintained at a first temperature, and adsorbed on a substrate held on a substrate holder, so that the precursor forms an adsorption restriction layer, while maintaining the substrate holder at a second temperature substantially. The first temperature is set higher than the second temperature at least about 10°C. Furthermore, at least a part of unadsorbed thin film precursor is removed from a space around the adsorbed thin film precursor, before forming a thin film layer by reaction of the adsorbed thin film precursor. The device includes a processing chamber, a substrate holder, a shower head, and one or a plurality of controllers for operating the device to use the above-mentioned thin film deposition technique.SELECTED DRAWING: Figure 8

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CHLOE BALDASSERONI
ADRIEN LAVOIE
KANG HU
QIAN JUN
PURUSHOTTAM KUMAR
ANDREW DUVALL
CODY BARNETT
MOHAMED SABRI
RAMESH CHANDRASEKHARAN
KARL LEESER
DAVID C SMITH
SESHASAYEE VARADARAJAN
EDMUND B MINSHALL

JP2015160010A

April 04, 2016

August 14, 2015

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LAM RES CORP

H01L21/205; C23C16/44; C23C16/52; H01L21/31; H01L21/316; H01L21/318

Meisei International Patent Office

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