Title:
METHOD FOR EXAMINING PHOTOMASK CLEANLINESS AND PHOTOMASK MANAGEMENT SYSTEM
Document Type and Number:
Japanese Patent JP2014211572
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an examination method capable of easily confirming the cleanliness of a photomask stored after final cleaning, and a photomask management system using the same.SOLUTION: A method for examining photomask cleanliness is provided which can determine cleanliness of a photomask by storing a substrate having a metal film with a catalytic action in the same environment as the photomask and thereafter irradiating the metal film of the substrate with UV light, and confirming whether or not precipitation of a crystal component is present, or an examination method for determining cleanliness of a photomask stored in the same environment by irradiating a photomask to be managed with UV light and confirming whether or not precipitation of a crystal component is present. Also, a photomask management system using these examination methods is provided. By using these methods, cleanliness of a photomask stored for a certain period of time after being finally cleaned can be easily confirmed. By carrying out a cleaning treatment again if necessary, defects due to haze can be prevented during transfer at a shipping destination.
Inventors:
SAKAI TAKAKO
Application Number:
JP2013088677A
Publication Date:
November 13, 2014
Filing Date:
April 19, 2013
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G03F1/84
Attorney, Agent or Firm:
Hirose 1
Toru Miyasaka
Toru Miyasaka
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