To provide a method of forming an on-chip lens which has a large effective diameter and has a high light convergence rate even for obliquely incident light, and a method of manufacturing a solid-state imaging apparatus including the method of forming the on-chip lens.

The method of forming the lens includes, in a step of forming a concave part, the sub-steps of: depositing a pattern film 50 formed of a second material and having an inverted shape of the concave part on a ground film 190; forming a burying film 71 in which the pattern film 50 is buried until the surface becomes flat by using a third material; and etching the burying film 51 back from the top toward the ground film 190 and digging the ground film 190 beneath the pattern film 50 to form a concave part. For the etching-back processing, a material having a higher etch rate than the third material is selectively used as the second material.

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