Title:
METHOD OF FORMING GRAPHENE FILM
Document Type and Number:
Japanese Patent JP2013234096
Kind Code:
A
Abstract:
To provide a method of forming a graphene film with high in-plane uniformity and reproducibility, and less damage.
By executing a reduction process for heating a metal film under a hydrogen gas atmosphere, a graphene film growth process for heating the metal film under a mixed gas atmosphere in which the composition ratio of an ethylene gas to a hydrogen gas is from 10 ppm or more to less than 1,000 ppm, and a cooling process for cooling the metal film, the formation of the graphene film with high in-plane uniformity and reproducibility and less damage can be enabled.
Inventors:
YOSHII SHIGEO
NOZAWA KATSUYA
MATSUKAWA NOZOMI
NOZAWA KATSUYA
MATSUKAWA NOZOMI
Application Number:
JP2012108256A
Publication Date:
November 21, 2013
Filing Date:
May 10, 2012
Export Citation:
Assignee:
PANASONIC CORP
International Classes:
C01B31/02; C23C16/02; C23C16/26; H01M4/583
Attorney, Agent or Firm:
Hiroki Naito
Daisuke Nagano
Kentaro Fujii
Daisuke Nagano
Kentaro Fujii
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