PURPOSE: To control a space between two orientation films to a prescribed thickness with scattering of ±0.5μm by controlling a height of the orientated film to the prescribed height by remaining selectively an epoxy adhesives, and by forming a spacer and the peripheral sealing agent with the epoxy adhesives which is the same material to that of the spacer and sealing agent.
CONSTITUTION: The titled device is formed by coating with the org. adhesives 8 such as the epoxy adhesives having photosensitive property on the one surface of the substrate 1 which forms an electrode 2, or forms an orientated film 3, thereon, in the prescribed height by means of a coating method followed by selectively exposing it with a mask to expose the photosensitive resin. The spacer 9 and the peripheral sealing part having a linear type, a block type or an optional adductor type are selectively formed by an etching step, after selectively exposing only a range which is not masked. Thus, even in case that the resin of acting as the spacer and the peripheral sealing agent of a cell has the uneveness in height, the coating film of the prescribed thickness with scattering of less than ±0.5μm is obtd. by selectively remaining the coating film which is the same material to that of the spacer and sealing agent.
KONUMA TOSHIMITSU
MASE AKIRA
TAKAYAMA TORU
OTAKA MASAICHI
YAMAGUCHI TOSHIJI
WATANABE TOSHIO
AOYANAGI OSAMU
TABATA KAORU
ISHIGAKI CHIZURU
SAKAYORI HIROYUKI
KOBAYASHI IPPEI
OSABE AKIO
YAMAZAKI SHUNPEI
| JPS61184518A | 1986-08-18 | |||
| JPS617822A | 1986-01-14 |