Title:
METHOD FOR FORMING MICROLENS
Document Type and Number:
Japanese Patent JP3677977
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve nonuniformity in sensitivity due to light-condensing position of microlenses.
SOLUTION: This method for forming microlenses comprises independently providing a microlens to each pixel on a pixel surface, comprised of multiple pixels and forming microlenses while correcting exit pupil. First, a resist is coated on the picture element surface to form a resist layer. Then the resist layer is patterned to form a resist pattern with exit pupil correction. Resist patterns 21a, 21b and 21c are formed in such a way that the space between adjacent resist patterns is made larger in the center of the pixel surface, and made gradually narrower toward the periphery of the pixel surface. After that, the resist patterns are treated by reflow to form convex microlenses and the curvature radius becomes gradually larger from the center of the pixel surface toward the periphery.
Inventors:
Keiji Yukihide
Application Number:
JP35657597A
Publication Date:
August 03, 2005
Filing Date:
December 25, 1997
Export Citation:
Assignee:
ソニー株式会社
International Classes:
H01L27/14; H01L27/146; (IPC1-7): H01L27/14
Domestic Patent References:
| JP9260624A | ||||
| JP5346556A | ||||
| JP4229803A | ||||
| JP9022995A |
Attorney, Agent or Firm:
Funabashi Kuninori
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