Title:
作業室の無菌環境維持方法、無菌環境維持装置
Document Type and Number:
Japanese Patent JP7240602
Kind Code:
B2
Abstract:
A technique is provided whereby hydrogen peroxide introduced into a working chamber containing a resin component is reduced to a low concentration in a shorter time than before. The present invention resides in a method of maintaining a sterile environment of a working chamber that contains a resin component, and includes a step (a) of introducing hydrogen peroxide into the working chamber, a step (b) of introducing air into the working chamber through a filter after completion of the step (a), a step (c) of generating ozone by irradiating the air with ultraviolet having a peak wavelength of from 160 nm to less than 200 nm upstream of the filter or inside the working chamber and introducing the ozone into the working chamber, and a step (d) of decomposing the ozone introduced into the working chamber into oxygen radicals.
Inventors:
Keisuke Naito
Application Number:
JP2019090797A
Publication Date:
March 16, 2023
Filing Date:
May 13, 2019
Export Citation:
Assignee:
Ushio, Inc.
International Classes:
A61L2/20; A61L2/10
Domestic Patent References:
| JP2008264506A | ||||
| JP2009125517A | ||||
| JP2008200511A | ||||
| JP2018153238A | ||||
| JP2016083193A | ||||
| JP2019017808A |
Foreign References:
| US20160008757 |
Attorney, Agent or Firm:
Patent Attorney Corporation Junias International Patent Office
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