To provide a method of efficiently manufacturing an antireflection film provided with a low refractive index silica aerogel film which has excellent scratch resistance and little variation of a refractive index, the antireflection film formed by the method, and an optical element provided with the antireflection film.
In the method of manufacturing the antireflection film provided with at least one layer of the silica aerogel film, the silica aerogel film is formed by applying mixed sol composed by mixing first acid sol of a median diameter ≤100 nm obtained by adding an acidic solution further to alkaline sol prepared by executing the hydrolysis and condensation polymerization of alkoxysilane under a basic catalyst and second acid sol of the median diameter ≤10 nm obtained by executing the hydrolysis and condensation polymerization of the alkoxysilane under an acid catalyst onto a substrate, drying it, and then executing humidity treatment of preserving it in the environment of the temperature ≥35°C and the relative humidity ≥70% for at least one hour. Also, the antireflection film obtained by the method of manufacturing it and the optical element are disclosed.
| JPS58211701 | LOW REFLECTANCE GLASS |
| JP2004315657 | EPOXY RESIN COMPOSITION SUITABLE FOR PROTECTING FILM |
YAMADA KAZUHIRO
NAKAYAMA HIROYUKI
FUJII HIDEO
KIKUCHI SEIJI
TAMADA TAKEAKI
| JP2009075583A | 2009-04-09 | |||
| JP2006151800A | 2006-06-15 | |||
| JP2006215542A | 2006-08-17 | |||
| JP2007052345A | 2007-03-01 | |||
| JP2003535804A | 2003-12-02 | |||
| JP2006096019A | 2006-04-13 | |||
| JP2003535804A | 2003-12-02 | |||
| JP2006096019A | 2006-04-13 | |||
| JP2006227596A | 2006-08-31 | |||
| JP2005221911A | 2005-08-18 | |||
| JP2009075583A | 2009-04-09 | |||
| JP2006151800A | 2006-06-15 | |||
| JP2006215542A | 2006-08-17 | |||
| JP2007052345A | 2007-03-01 |