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Title:
METHOD OF MANUFACTURING FILAMENT, AND FILAMENT
Document Type and Number:
Japanese Patent JP2015176769
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing a filament equipped with a dielectric film, by which stable radiation characteristics can be obtained even if the filament is heated.SOLUTION: An amorphous dielectric film 20 is formed on the surface of a base material 10 made of metal by a dielectric material the stable crystal structure of which is a monoclinic system at room temperatures and is transited to a tetragonal system by phase transition (film forming process). Then, the amorphous dielectric film 20 is heated, thereby, the crystal structure is changed to the tetragonal system or a mixed state of the tetragonal system and a cubic system without going through the monoclinic system, and the dielectric film 20 the crystal structure of which is the tetragonal system or is in the mixed state of the tetragonal system and the cubic system at room temperatures is formed(heating process). Since the dielectric film does not go through phase transition from the monoclinic system to the tetragonal system, cracks due to cubic expansion and contraction in it is not caused.

Inventors:
KAWAKAMI YASUYUKI
EMOTO KEI
KOIZUMI TOMOAKI
Application Number:
JP2014052617A
Publication Date:
October 05, 2015
Filing Date:
March 14, 2014
Export Citation:
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Assignee:
STANLEY ELECTRIC CO LTD
International Classes:
H01K3/02; H01K1/10
Attorney, Agent or Firm:
Patent Business Corporation Sannozaka Patent Office