To provide a heat-resistant and light-shielding film capable of suppressing abrupt deposition of an oxide layer on the surface of a metal target by a reactive gas, depositing the metal oxide film of the metal oxide composition with excellent reproducibility by reactive sputtering, and achieving high light-shielding property, low reflectance and low glossiness in a visible ray region of the wavelength of 380-780 nm.
In the manufacturing method of the heat-resistant and light-shielding film in which a metallic film is deposited on a heat-resistant resin film, and a metal oxide film is successively deposited on the metal film, after depositing the metal film, the initial stage pre-sputtering, the middle-stage pre-sputtering, and the final stage pre-sputtering are successively performed for the predetermined time with the predetermined ratio of the flow rate of the reactive gas to the sputtering gas for continuously depositing the metal oxide film without stopping the sputtering of the metal target used for the film deposition of the metal film, and the permanent sputtering is performed with the ratio of the gas flow rate when the final stage pre-sputtering is completed.
TSUKAGOSHI YUKIO
ABE TAKAYUKI
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Masayuki Fujinaka
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