Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD OF MANUFACTURING LIQUID CRYSTAL DEVICE
Document Type and Number:
Japanese Patent JP2009216980
Kind Code:
A
Abstract:

To suppress variation of a common voltage and to improve a display quality.

A method of manufacturing a liquid crystal device which comprises first and second substrates, first and second electrodes, and a first liquid crystal comprises: a process (S1) of determining a relation between each film-forming condition of third or fourth electrode and the variation of the common voltage of a test cell when a voltage is applied between the third and fourth electrodes, as for the test cell in which a second liquid crystal is interposed between the third substrate and the fourth substrate; a process (S2) of determining the variation of the common voltage of the liquid crystal device when the first and second electrodes are film-formed under the same condition as each other; a process (S3) of determining the film-forming condition of the first and second electrodes, on the basis of the relation between the film-forming conditions of the third and fourth electrodes and the variation of the common voltage of the test cell, and the variation of a common voltage of the liquid crystal device; and a process (S4) of performing the film-formation of the first and second electrodes on the first and second substrates, on the basis of the determined film-forming condition of the first and second electrodes, and manufacturing the liquid crystal device.


Inventors:
SAKAMOTO KAZUYA
Application Number:
JP2008060684A
Publication Date:
September 24, 2009
Filing Date:
March 11, 2008
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SEIKO EPSON CORP
International Classes:
G02F1/1343; C23C14/08; C23C14/34; G02F1/13
Attorney, Agent or Firm:
Masahiko Ueyanagi
Osamu Suzawa
Kazuhiko Miyasaka