To prevent destruction of a mother substrate due to expansion of air in the mother substrate when sputtering an ITO film on a surface of the mother substrate after forming a plurality of liquid crystal cells on the mother substrate in a method for manufacturing an IPS liquid crystal display device.
A plurality of liquid crystal cells 1 are formed on the mother substrate. The mother substrate is immersed in a polishing liquid as it is and is polished to be thinned. During polishing, the inside of the mother substrate is sealed up by a mother substrate sealant 61 sealing a mother TFT substrate 60 and a mother counter substrate 70. Before a surface conductive film is formed on the side of the mother counter substrate 70 of the mother substrate, the mother substrate sealant 61 is partially broken to break sealing-up of the inside of the mother substrate. Thus a phenomenon that the mother substrate is broken by expansion of air therein during formation of the surface conductive film can be avoided.
ISHII AKIRA
OGISHIMA YOSHITOMO
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