To provide an optical element manufacturing method that is capable of manufacturing an optical element having predetermined light distribution characteristics, without creating a density distribution in a transparent layer and without reducing yields, and that is capable of ensuring the flatness of the interface surface between a transparent layer of a microlouver and a light absorbing layer.
The optical element manufacturing method includes the steps of: disposing a mask on a transparent photosensitive resin 51; patterning the transparent photosensitive resin by applying an exposure light to the transparent photosensitive resin 51 through the mask to form a transparent layer 51b; forming a light absorbing layer by filling a gap in the transparent layer 51b with a black curable resin 53; and illuminating a mask surface 52a of the mask 52 with the exposure light at an angle.
SUMIYOSHI KEN
| JP2005072662A | 2005-03-17 | |||
| JPS625406A | 1987-01-12 | |||
| JPH08194217A | 1996-07-30 | |||
| JPH10333251A | 1998-12-18 | |||
| JPH10319384A | 1998-12-04 | |||
| JP2004029673A | 2004-01-29 |
Ishibashi Masayuki
Masaaki Ogata