レジストパターンの製造方法 - Sumitomo Chemical Co., Ltd.

Title:

レジストパターンの製造方法

Document Type and Number:

Japanese Patent JP7002234

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a method for producing a resist pattern, capable of producing a resist pattern with a good mask error factor (MEF).SOLUTION: The method for producing a negative resist pattern includes the steps of: applying a negative resist composition which contains a resin having a structural unit derived from a compound represented by formula (I) and a structural unit represented by formula (a3-4) and an acid generator onto a substrate; exposing the negative resist composition; subjecting the negative resist composition to PEB; and developing the negative resist composition with a negative developer containing an organic solvent as a main component.SELECTED DRAWING: None

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Inventors:

Yoshida Isao
Araki incense
Koji Ichikawa

Application Number:

JP2017131236A

Publication Date:

January 20, 2022

Filing Date:

July 04, 2017

Export Citation:

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Assignee:

Sumitomo Chemical Co., Ltd.

International Classes:

C08F220/28; G03F7/038; G03F7/004; G03F7/039; G03F7/20; G03F7/32

Domestic Patent References:

JP2015014773A

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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