Title:
METHOD FOR MANUFACTURING RETARDATION FILM
Document Type and Number:
Japanese Patent JP2010217278
Kind Code:
A
Abstract:
To provide a method for manufacturing a retardation film, which forms an optically anisotropic film with no alignment substrate, and sets a desired phase difference value without changing a thickness.
A photosensitive layer is formed on a film as a base material, heated up to an isotropic phase transition temperature or more, and cooled to a glass phase-liquid crystal phase transition temperature or less. The cooled photosensitive layer is irradiated with a polarized light, and 1 to 25% of photosensitive groups contained in the photosensitive layer are reacted by the irradiation with the polarized light to form the optically anisotropic film, and the optically anisotropic film is heated to obtain the retardation film.
Inventors:
KATO KUNIHISA
ORUI TOMOO
MORI TSUYOSHI
ORUI TOMOO
MORI TSUYOSHI
Application Number:
JP2009061127A
Publication Date:
September 30, 2010
Filing Date:
March 13, 2009
Export Citation:
Assignee:
LINTEC CORP
International Classes:
G02B5/30; G02F1/13363
Attorney, Agent or Firm:
Seiryu Corporation
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