Title:
METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK AND PROCESSING MASK
Document Type and Number:
Japanese Patent JP2019042762
Kind Code:
A
Abstract:
To provide a method for manufacturing a vapor deposition mask by which shortening of a processing time can be achieved while reducing variation in an opening dimension, and a processing mask.SOLUTION: A method for manufacturing a vapor deposition mask having plural open holes. According to this method, a processing mask 1 is set to a movement start position by a mobile device 4 on which the processing mask is loaded, a processing object 9 is positioned at a processing position, at which an open hole 91 is formed in a processing face which becomes an irradiation area of laser beam L, by a stage device 7 on which the processing object is loaded, the processing mask is moved according to a predetermined processing route from the movement start position, and laser beam is emitted at each time when a mark region M is detected by an optical sensor 5 in association with movement of the processing mask. Laser beam, which has penetrated a light transmitting region associated with the mark region at each time of emission of laser beam, is reduced and projected onto the processing face until formation of an open hole. A series of processing from setting of the processing mask to the movement start position to reduced projection of laser beam onto the processing face is repeated until formation of a predetermined number of open holes is ended.SELECTED DRAWING: Figure 6
Inventors:
YANAGAWA YOSHIKATSU
MATSUYAMA SHOTA
MATSUYAMA SHOTA
Application Number:
JP2017167397A
Publication Date:
March 22, 2019
Filing Date:
August 31, 2017
Export Citation:
Assignee:
V TECH CO LTD
International Classes:
B23K26/384; B23K26/00; B23K26/066; C23C14/04
Attorney, Agent or Firm:
Moriaki Ogawa
Haruyuki Nishiyama
Shoichi Okuyama
Haruyuki Nishiyama
Shoichi Okuyama