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Title:
METHOD OF PRECLEANING POLYMER DEBRIS
Document Type and Number:
Japanese Patent JP3876983
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a method for precleaning a polymer debris to be removed by softening and burning the debris.
SOLUTION: In the method for precleaning a polymer debris, etching treatment using a perfluocarbon gas is carried out and then a specific gas mixture is provided. Next, a plasma generated from the gas mixture is used to preclean a polymer debris. The specific gas mixture is selected from the group of a gas mixture of oxygen and nitrogen, a gas mixture of hydrogen and argon, a gas mixture of argon and nitrogen, and a gas mixture of oxygen and argon. The plasma generated from the gas mixture can perfectly remove the polymer debris in the next cleaning operation in order to soften, burn and remove the polymer debris. Therefore, a running time for the next cleaning operation can be shortened.


Inventors:
Kure Yan
What wind
Grandchild
Hong Ren
Application Number:
JP2002214012A
Publication Date:
February 07, 2007
Filing Date:
July 23, 2002
Export Citation:
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Assignee:
Lianhua Electronics Co., Ltd.
International Classes:
H01L21/3065; H01L21/311; (IPC1-7): H01L21/3065
Domestic Patent References:
JP10125661A
JP6275581A
JP11340198A
JP2000352827A
Attorney, Agent or Firm:
Shogo Ehara
Hideka Tanaka
Yoshiyuki Shiraishi
Kunihiko Shiromura
Tsuyoshi Kumano
Hiroaki Yamane