Title:
METHOD FOR PREPARING RESIST SOLUTION
Document Type and Number:
Japanese Patent JP3444562
Kind Code:
B2
Abstract:
PURPOSE: To suppress the generation of fine particles even in a long-term storage, and minimize the difference in fine particle generating quantity according to storing temperature by mixing an alkali-soluble resin, a quinonediamide group-contained compound, and an organic solvent together, and heating the resulting mixture at a temperature within a specified range.
CONSTITUTION: An alkali-soluble resin, an quinonediamide group-contained compound, and an organic solvent are mixed together, and the resulting mixture is heated to a temperature of 75-85°C until the absorptivity in a wavelength of 500nm is within 0.05 and 0.75. The resist solution prepared according to this method is excellent in long-term life stability, and can be suppressed in generation of fine particles even when stored for 1 month or more, the difference in fine particle generating quantity according to storing temperature is minimized, and the generation of fine particle is also minimized even when a quinonediazide group-contained compound having a high esterification degree is used. Thus, it is suitably used for the manufacture of an electronic part to which a high yield is required.
Inventors:
Koji Shiihara
Application Number:
JP6994595A
Publication Date:
September 08, 2003
Filing Date:
March 28, 1995
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; G03F7/022; H01L21/027; (IPC1-7): G03F7/004; G03F7/022; H01L21/027
Domestic Patent References:
| JP6256565A | ||||
| JP63113451A | ||||
| JP6470746A | ||||
| JP7287391A |
Attorney, Agent or Firm:
Akira Agata