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Title:
METHOD FOR PRODUCING ELECTRIC CONTACT
Document Type and Number:
Japanese Patent JP2013204102
Kind Code:
A
Abstract:

To provide a method for producing an electric contact that can stably reduce inductive reactance, for example, in high-frequency signal transmission.

A nickel-phosphorous alloy plating film 12 is formed on the surface of a base material 11 comprising a metal material by an electroplating method. In the film formation, a phosphorus content in the film is set in the range of 10-18 mass%. A surface layer plating film 13 comprising, for example, a noble metal-based or soldering metal material-based plating film, is formed on the nickel-phosphorous alloy plating film 12. Furthermore, a metal plating coating comprising the nickel-phosphorous alloy plating film 12 and the surface layer plating film 13 is formed on the base material 11, and thereafter subjected to heat treatment at a temperature in the range of 200-270°C. Thus, an electric contact that is thermally stable and has non-magnetic properties is prepared, and excellent high-frequency characteristics can be obtained.


Inventors:
WATANABE KOJI
TAKESHITA YOSHIAKI
Application Number:
JP2012075317A
Publication Date:
October 07, 2013
Filing Date:
March 29, 2012
Export Citation:
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Assignee:
YAMAICHI ELECTRONICS CO LTD
International Classes:
C25D7/00; C25D5/12; C25D5/50; H01R13/03; H01R43/16
Domestic Patent References:
JPH11317253A1999-11-16
JPH0359972A1991-03-14
JP2003003292A2003-01-08
JP2002339097A2002-11-27
JP2010176863A2010-08-12
JP2005248268A2005-09-15
JP2006294592A2006-10-26
JPH11317253A1999-11-16
JPH0359972A1991-03-14
JP2003003292A2003-01-08
JP2002339097A2002-11-27
Foreign References:
WO2010005088A12010-01-14
WO2010005088A12010-01-14
Attorney, Agent or Firm:
Patent Business Corporation Tani/Abe Patent Office