Title:
METHOD FOR PRODUCING HIGH PURITY SILICA
Document Type and Number:
Japanese Patent JP2012001421
Kind Code:
A
Abstract:
To provide a method for producing high purity silica easily and inexpensively.
This method for producing high purity silica includes (B) a silica recovery process in which alkali silicate aqueous solution having ≥6.0 mass% of Si concentration in a liquid portion is mixed with a mineral acid, and Si in the liquid portion is deposited as non-gel-shaped precipitated silica, and then solid-liquid separation is performed to acquire a solid portion containing SiO2 and a liquid portion containing impurities. The alkali silicate aqueous solution is a mixture of silica-containing mineral powder and alkali aqueous solution, or water glass, or the like.
Inventors:
ICHINOTSUBO YUKITERU
MEIDO TAKESHI
KONO TSUNEHEI
KUMASAKA JUN
MASUDA KENTA
YAMADA KAZUO
MEIDO TAKESHI
KONO TSUNEHEI
KUMASAKA JUN
MASUDA KENTA
YAMADA KAZUO
Application Number:
JP2010237721A
Publication Date:
January 05, 2012
Filing Date:
October 22, 2010
Export Citation:
Assignee:
TAIHEIYO CEMENT CORP
International Classes:
C01B33/18
Domestic Patent References:
| JPS6321213A | 1988-01-28 | |||
| JP2010030839A | 2010-02-12 | |||
| JP2010030873A | 2010-02-12 | |||
| JPH01153564A | 1989-06-15 | |||
| JPS6321213A | 1988-01-28 | |||
| JP2010030839A | 2010-02-12 | |||
| JP2010030873A | 2010-02-12 | |||
| JPH01153564A | 1989-06-15 |
Attorney, Agent or Firm:
Naoyuki Koda
Shuichi Kitamura
Shuichi Kitamura
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