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Title:
METHOD FOR PRODUCING N-SUBSTITUTED (METH)ACRYLIC AMIDE
Document Type and Number:
Japanese Patent JP2016074620
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for simply and inexpensively producing an N-substituted (meth)acrylic amide without need of heat treatment for decomposing a Michael adduct by-produced in an amidation reaction of an ester nor protection-deprotection treatment of a double bond and to provide a method for producing an N-substituted (meth)acrylic amide-containing polymer.SOLUTION: The method for producing an N-substituted (meth)acrylic amide includes reacting a (meth)acrylic acid ester represented by Formula (1) with an amine represented by Formula (2) in the presence of a catalyst while maintaining a temperature of a reaction mixture at 50°C or lower to produce an N-substituted (meth)acrylic amide represented by Formula (3). Formula (1): CH=CRCOOR(R is a hydrogen atom or a methyl group; and Ris a lower alkyl group; Formula (2): R-NH-R(Rand Rare each independently a hydrogen atom, an alkyl group or an alkyl group having a substituent); and Formula (3):CH=CRCON(R)-R(R is the same as that in Formula (1); and Rand Rare the same as those in Formula (2))SELECTED DRAWING: None

Inventors:
FUKUI KOICHI
Application Number:
JP2014205261A
Publication Date:
May 12, 2016
Filing Date:
October 03, 2014
Export Citation:
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Assignee:
AT SILICA CO LTD
International Classes:
C07C231/02; C07C233/20; C08F8/32
Attorney, Agent or Firm:
Katsuyuki Okubo
Yasuko Tanaka