Title:
METHOD FOR PRODUCING PENTAFLUOROETHANE AND USE THEREOF
Document Type and Number:
Japanese Patent JP2005053805
Kind Code:
A
Abstract:
To industrially advantageously produce a higher purity pentafluoroethane usable as a material in the production of refrigerants for low temperatures, etching gases, or high-purity hexafluoroethane.
The method comprises the step of bringing crude pentafluoroethane into contact with oxygen and/or an oxygenous compound in the presence of a catalyst. The moisture contained in the reaction substrate gas in the step is 2 vol% or lower. Pentafluoroethane having a total impurity content of 400 vol ppm or lower can be obtained.
Inventors:
KAGA ICHIYU
ONO HIROMOTO
ONO HIROMOTO
Application Number:
JP2003206761A
Publication Date:
March 03, 2005
Filing Date:
August 08, 2003
Export Citation:
Assignee:
SHOWA DENKO KK
International Classes:
C07C17/395; C07C17/158; C07C19/08; (IPC1-7): C07C17/395; C07C17/158; C07C19/08
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Yoshio Yoshio
Tetsuji Koga
Masaya Nishiyama
Takashi Ishida
Yoshio Yoshio
Tetsuji Koga
Masaya Nishiyama
Previous Patent: METHOD FOR PRODUCING [11C]CH3X
Next Patent: COMPOUND FOR ORGANIC EL ELEMENT, METHOD FOR PRODUCING THE SAME, AND ORGANIC EL ELEMENT
Next Patent: COMPOUND FOR ORGANIC EL ELEMENT, METHOD FOR PRODUCING THE SAME, AND ORGANIC EL ELEMENT