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Title:
METHOD FOR PRODUCING POLYMER FOR PHOTORESIST
Document Type and Number:
Japanese Patent JP2009249400
Kind Code:
A
Abstract:

To provide a high-productivity method, by which contamination by impurities (a foreign metal and a metal constituent in particular) can be sufficiently reduced in a production process, for producing a polymer with a maximally reduced impurity content for a photoresist.

The method for producing a polymer for a photoresist includes a process for feeding a liquid material by a plurality of nonmetal lining pipes. In the joint part between the nonmetal lining pipes, an earth material is inserted so as to be brought into contact with the liquid material to be supplied, and the liquid material is supplied while grounding the earth material.


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Inventors:
SUGAWARA TETSUNORI
MAEDA YOSHIO
UCHIDA SHINGO
Application Number:
JP2008095269A
Publication Date:
October 29, 2009
Filing Date:
April 01, 2008
Export Citation:
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Assignee:
JSR CORP
International Classes:
C08F2/01
Domestic Patent References:
JPH02133588A1990-05-22
JP2005313598A2005-11-10
JP2002177858A2002-06-25
JPH09286490A1997-11-04
JP2006242285A2006-09-14
JPH02133588A1990-05-22
JP2005313598A2005-11-10
JP2002177858A2002-06-25
Attorney, Agent or Firm:
Ippei Watanabe
Koji Kikawa
Chongqing Sugano



 
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