Title:
METHOD OF PRODUCING POROUS FILM, AND ANTI-REFLECTION FILM
Document Type and Number:
Japanese Patent JP2012006790
Kind Code:
A
Abstract:
To provide a method of producing a porous film having a high film strength and a low refractive index while maintaining porosity, and an anti-reflection film having a low refractive index.
The method of producing a porous film composed mainly of silica includes: a process to apply and dry on a substrate a sol reactive liquid containing organic matter, silica precursor materials, alcohol, catalyst made of acid or base, and water; a process to calcine the substrate, remove the organic matter and form a silica porous film on the substrate; and a process to perform UV ozone treatment to the silica porous film. The anti-reflection film is provided having a porous film obtained by the production method.
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Inventors:
TAKAHASHI MASAHIKO
Application Number:
JP2010144281A
Publication Date:
January 12, 2012
Filing Date:
June 24, 2010
Export Citation:
Assignee:
CANON KK
International Classes:
C01B33/12
Attorney, Agent or Firm:
Takuma Abe
Sogo Kuroiwa
Sogo Kuroiwa
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